Radiation-sensitive composition and compound

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United States of America Patent

PATENT NO 9128370
APP PUB NO 20130149644A1
SERIAL NO

13759118

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Abstract

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A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each R0 independently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. R1 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. R2 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rf represents a fluoromethylene group or a divalent fluoroalkylene group. M+ represents a monovalent onium cation. Optionally R1 bonds to Rf or R2 to form a cyclic structure.

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Patent Owner(s)

Patent OwnerAddress
JSR CORPORATION9-2 HIGASHI-SHINBASHI 1-CHOME MINATO-KU TOKYO 1058640 ?1058640

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Maruyama, Ken Tokyo, JP 59 114

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