FILM-FORMING APPARATUS AND FILM-FORMING METHOD
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United States of America Patent
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Issued Date -
Jun 20, 2013
app pub date -
Dec 14, 2012
filing date -
Dec 15, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A film-forming apparatus 100 supplies a plurality of gases toward a substrate 101 in a chamber 103 using a shower plate 124. The shower plate 124 has a plurality of gas flow paths 121 extending within the shower plate along a first face of the substrate 101 side and connected to gas pipes 131 supplying a plurality of gases, and a plurality of gas jetting holes 129 bored such that the plurality of gas flow paths 121 and the chamber 103 communicate with each other on the first face side. In the film-forming apparatus 100, the plurality of gases supplied from the gas pipes 131 to the plurality of gas flow paths 121 of the shower plate 124 are supplied from the gas jetting holes 129 to the substrate 101 without being mixed inside of and vicinity of the shower plate 124.
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