Stereolithography Systems and Methods Using Internal Laser Modulation
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United States of America Patent
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Issued Date -
Jun 20, 2013
app pub date -
Dec 15, 2011
filing date -
Dec 15, 2011
priority date (Note) -
Abandoned
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Abstract
Stereolithography systems (10) and methods using internal laser modulation are disclosed. The system includes an internally modulated diode-pumped frequency-multiplied solid-state (DPFMSS) laser 40. There is no external modulation system (EMS) within an external optical path (OPE) between the laser and a scanning system (80). The scanning system directs a laser beam (72) with laser pulses (72P) to a focus position (FP) on surface (23) of a build material (22) to form bullets (25) therein to define a build layer (30) based on build instructions for forming a three-dimensional object (32).
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