NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME
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United States of America Patent
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Issued Date -
Jun 27, 2013
app pub date -
Dec 21, 2012
filing date -
Dec 23, 2011
priority date (Note) -
Abandoned
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Abstract
Disclosed are an acrylic monomer having a structure represented by formula (1), a polymer containing a repeating unit derived from the acrylic monomer, and a resist composition prepared by using the polymer, which exhibits excellent adhesiveness, storage stability, and enhanced line width roughness, exhibits excellent resolution in both C/H patterns and L/S patterns, has an excellent process window so that an excellent pattern profile can be obtained regardless of the type of the substrate, and exhibits improved contrast.
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