LASER ANNEALING APPARATUS
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United States of America Patent
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Issued Date -
Jul 25, 2013
app pub date -
Jan 23, 2013
filing date -
Jan 23, 2012
priority date (Note) -
Abandoned
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Abstract
According to one embodiment, a laser annealing apparatus includes a laser device configured to emit a pulse laser beam, an anneal chamber including a stage on which a process substrate, on which an amorphous silicon thin film is formed, is placed, an optical module disposed between the laser device and the anneal chamber and configured to guide the pulse laser beam, which is emitted from the laser device, to the anneal chamber, a platform frame on which the laser device, the anneal chamber and the optical module are mounted, and an elastic body configured to lift the platform frame from a building floor.
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