Gas Dispersion Plate for Plasma Reactor Having Extended Lifetime
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United States of America Patent
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Issued Date -
Aug 8, 2013
app pub date -
Feb 4, 2013
filing date -
Feb 2, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The invention includes a gas dispersion plate to provide reactant gases to a reaction chamber comprising: a plate body having a first surface and a second surface, the plate body having at least one injection passage that spans the plate from the first surface to the second surface, the distance along the passage from the first surface to the second surface defining the length of the passage, wherein the injection passage includes an ion trap chamber, through which gas flows from the first surface of the plate to the second surface of the plate. In an embodiment, the passage includes an inlet portion interposed between the first surface and the chamber and an outlet portion that is interposed between the ion trap chamber and the second surface.
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