Polishing composition and polishing method

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United States of America Patent

PATENT NO 9117761
APP PUB NO 20130203254A1
SERIAL NO

13814644

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Abstract

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A polishing composition contains a water-soluble polymer, a polishing accelerator, and an oxidizing agent. The water-soluble polymer is a polyamide-polyamine polymer having an amine value of 150 mg KOH/1 g·solid or greater.

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Patent Owner(s)

  • FUJIMI INCORPORATED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirano, Tatsuhiko Kiyosu, JP 23 223
Izawa, Yoshihiro Kiyosu, JP 35 531
Sumita, Kazuya Kiyosu, JP 5 9
Tamada, Shuichi Kiyosu, JP 13 40
Umeda, Takahiro Kiyosu, JP 30 129

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