Methods and apparatus for employing an accelerated neutral beam for improved surface analysis

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United States of America Patent

PATENT NO 10627352
APP PUB NO 20130213933A1
SERIAL NO

13590405

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Abstract

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Apparatus and methods are disclosed for employing an accelerated neutral beam derived from an accelerated gas cluster ion beam as a physical etching beam for providing reduced material mixing at the etched surface, compared to previous techniques. This results in the ability to achieve improved depth profile resolution in measurements by analytical instruments such as SIMS and XPS (or ESCA) analytical instruments.

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Patent Owner(s)

Patent OwnerAddress
EXOGENESIS CORPORATION30 WASHINGTON STREET WELLESLEY HILLS MA 02481

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kirkpatrick, Allen R Carlisle, US 28 635
Kirkpatrick, Sean R Littleton, US 60 404

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