METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE WITH A LATERAL PATTERN FOR APPLICATION IN THE XUV WAVELENGTH RANGE, AND BF AND LMAG STRUCTURES MANUFACTURED ACCORDING TO THIS METHOD
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United States of America Patent
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Aug 29, 2013
app pub date -
Dec 8, 2010
filing date -
Dec 11, 2009
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Abstract
Method for manufacturing a multilayer structure with a lateral pattern, in particular of an optical grating for application in an optical device for electromagnetic radiation with a wavelength in the wavelength range between 0.1 nm and 100 nm, comprising the steps of (i) providing a multilayer structure, and (ii) arranging a lateral three-dimensional pattern in the multilayer structure, wherein step (ii) of arranging the lateral pattern is performed by means of a method for nano-imprint lithography (NIL), and BF and LMAG structures manufactured according to this method.
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