PLASMA SHIELD DEVICE AND PLASMA SOURCE APPARATUS
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United States of America Patent
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Issued Date -
Sep 12, 2013
app pub date -
Mar 7, 2013
filing date -
Mar 9, 2012
priority date (Note) -
Abandoned
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Abstract
The plasma shield device (13) comprises a hollow structure (40) made of monocrystal body of silicon carbide and having an inside space (40a) and a first and second openings (40b,40c) which are opposed to each other across the inside space. During operation of the plasma generation apparatus, the internal space of the hollow structure forms a discharge zone in which the plasma is generated. Discharge gas is supplied to the internal space of the hollow structure through the first opening and the EUV radiation is mainly emitted through the second opening.
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