METHOD FOR CLEANING TEXTURED SILICON WAFERS
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United States of America Patent
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Issued Date -
Sep 26, 2013
app pub date -
Mar 26, 2012
filing date -
Mar 26, 2012
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Abstract
Substrates for solar cells are prepared by the reverse of the standard RCA clean. The substrates are first cleaned in RCA-2 solution and then in RCA-1 solution. A pyramids rounding step using HF/HNO3 solution is inserted between the two RCA clean procedures. This solves all the issues relating to surface contaminations and sharp areas. It also avoids the stain layer on the surface to some extent by RCA-1 treatment. A thin layer of amorphous or micro-crystalline intrinsic silicon may be deposited to passivate the surface.
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