APPARATUS AND METHOD TREATING SUBSTRATE
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United States of America Patent
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Issued Date -
Oct 3, 2013
app pub date -
Mar 27, 2013
filing date -
Mar 28, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate treating apparatus is provided which includes a housing which provides a space in which a process is performed; a spin head which supports and rotates a substrate; and a spray unit which sprays a fluid on the substrate. The spray unit comprises a first nozzle mistily spraying a first fluid; and second nozzle spraying a second fluid.
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Cited Art Landscape
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