Optimization and Control of Material Processing Using a Thermal Processing Torch
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United States of America Patent
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app pub date -
Jul 27, 2012
filing date -
Apr 4, 2012
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Abandoned
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Abstract
A method is provided for configuring two thermal processing systems. The method includes providing a first consumable for use in a first thermal processing torch and a second consumable for use in a second thermal processing torch. The first and second consumables have substantially identical physical characteristics. The first and second torches are mounted in a first thermal process system and a second thermal processing system, respectively. The method also includes sensing, by the first thermal processing system, first data stored in a first signal device associated with the first consumable and sensing, by the second thermal processing system, second data stored in a second signal device associated with the second consumable.
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