METHODS AND APPARATUS FOR GENERATING AND DELIVERING A PROCESS GAS FOR PROCESSING A SUBSTRATE
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United States of America Patent
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Issued Date -
Oct 17, 2013
app pub date -
Mar 14, 2013
filing date -
Mar 30, 2012
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Abstract
Methods and apparatus for generating and delivering process gases for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a container comprising a lid, a bottom, and a sidewall, wherein the lid, the bottom, and the sidewall define an open area; a solid precursor collection tray disposed within the open area; a gas delivery tube disposed within the open area and extending toward the solid precursor collection tray to provide a gas proximate the solid precursor collection tray; and a purge flow conduit coupled to the open area.
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