DISTRIBUTED ELECTRO-STATIC CHUCK COOLING
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United States of America Patent
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Issued Date -
Oct 24, 2013
app pub date -
Apr 15, 2013
filing date -
Apr 23, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
Embodiments of the invention include an apparatus, system, and method for cooling a pedestal for supporting a workpiece during plasma processing. An embodiment of a pedestal includes: a base over which the workpiece is to be disposed, a plurality of nozzles to supply a fluid from a supply plenum to impinge on a surface of the base, and a plurality of return conduits to return the supplied fluid to a return plenum. The fluid to be supplied by the plurality of nozzles can be projected as one or more jets submerged in surrounding fluid or as a spray that emerges from a surrounding fluid within a volume between the plurality of nozzles and the base to impinge on the surface of the base.
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