METHOD AND SYSTEM FOR PRODUCING HIGH RESOLUTION PATTERNS IN REGISTRATION ON THE SURFACE OF A SUBSTRATE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Oct 24, 2013
app pub date -
Apr 20, 2012
filing date -
Apr 20, 2012
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method of selectively applying a material to a surface of a substrate from a stamp with a raised surface using an energy activated release layer is provided. The release layer is applied to at least a first portion of a surface of the stamp. A layer of the material is applied to the raised surface of the stamp. The raised surface of the stamp is placed in contact with the surface of the substrate such that the material layer is situated therebetween. Thereafter, the release layer is activated with energy, causing the material layer to release from the raised surface of the stamp, and to adhere to the surface of the substrate. Alternatively, the entire stamp surface may be coated with the release layer and the release layer may be selectively activated in the areas in which the material on the stamp surface is in contact with the substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully