METHOD AND SYSTEM FOR USE IN MEASURING IN COMPLEX PATTERNED STRUCTURES
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United States of America Patent
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Oct 24, 2013
app pub date -
Jan 3, 2012
filing date -
Jan 3, 2011
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Abstract
A method and system are presented for use in measuring in complex patterned structures. A full model and at least one approximate model are provided for the same measurement site in a structure, said at least one approximate model satisfying a condition that a relation between the full model and the approximate model is defined by a predetermined function. A library is created for simulated data calculated by the approximate model for the entire parametric space of the approximate model. Also provided is data corresponding to simulated data calculated by the full model in selected points of said parametric space. The library for the approximate model data and said data of the full model are utilized for creating a library of values of a correction term for said parametric space, the correction term being determined as said predetermined function of the relation between the full model and the approximate model. This enable to process measured data by fitting said measured data to the simulated data calculated by the approximate model corrected by a corresponding value of the correction term.
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