APPARATUS AND METHOD FOR CLEANING SUBSTRATES
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United States of America Patent
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Issued Date -
Oct 31, 2013
app pub date -
Apr 30, 2013
filing date -
Apr 30, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The substrate cleaning apparatus includes a first process chamber in which a liquid treating process is performed on a substrate by supplying a treating solution, a second process chamber in which a drying process is performed on the substrate, and a carrying unit carrying the substrate between the first process chamber and the second process chamber. The first process chamber includes a liquid treating housing providing a space in which the liquid treating process is performed on the substrate, a spin chuck supporting the substrate within the liquid treating housing, and a liquid supply member supplying the treating solution onto the substrate supported by the spin chuck. The second process chamber includes a drying housing providing a space in which the substrate is dried, a substrate support member supporting the substrate within the drying housing, and a heater heating the substrate.
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