Differentiated liftoff process for ultra-shallow mask defined narrow trackwidth magnetic sensor
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United States of America Patent
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Mar 24, 2015
Grant Date -
Oct 31, 2013
app pub date -
Apr 27, 2012
filing date -
Apr 27, 2012
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Abstract
A method for manufacturing a magnetic read sensor allows for the construction of a very narrow trackwidth sensor while avoiding problems related to mask liftoff and shadowing related process variations across a wafer. The process involves depositing a plurality of sensor layers and forming a first mask structure. The first mask structure has a relatively large opening that encompasses a sensor area and an area adjacent to the sensor area where a hard bias structure can be deposited. A second mask structure is formed over the first mask structure and includes a first portion that is configured to define a sensor dimension and a second portion that is over the first mask structure in the field area.
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