Integrated system for vapor generation and thin film deposition
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United States of America Patent
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Issued Date -
Nov 28, 2013
app pub date -
Aug 6, 2013
filing date -
Mar 26, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet section in fluid communication with a downstream vaporization chamber section. The inlet section comprises a gas inlet for receiving gas from a gas source through a gas flow sensor and a gas flow control valve and a liquid inlet for receiving liquid from a liquid source through a liquid flow sensor and a liquid flow control valve. An electronic controller controls the gas and liquid flow control valves thereby controlling the rates of gas and liquid flow into the inlet section to generate vapor in the downstream vaporization chamber section for thin film deposition on the substrate.
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