PATTERNED RETARDER PLATE AND MANUFACTURING METHOD THEREOF

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United States of America Patent

SERIAL NO

13995567

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Abstract

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Provided is a method for manufacturing a patterned retarder plate including a liquid crystal sheet on which a retarding pattern with a λ/4 wavelength by forming a patterned align layer on a photo align layer by performing an align process once. The method for manufacturing a retarder plate according to the exemplary embodiments of the present invention can implement the photoalign through a single process during the photoalign process using the mask, thereby reducing the defect rate due to the existing method and reducing the process costs.

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Patent Owner(s)

Patent OwnerAddress
SK INNOVATION CO LTD26 JONG-RO JONGNO-GU SEOUL 03188

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Jee Young Seoul, KR 2 3
Kim, Hyuk Jun Daejeon, KR 10 9
Son, Sung Ho Daejeon, KR 44 1090

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