MANUFACTURING METHOD OF MAGNETIC DISK SUBSTRATE
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United States of America Patent
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Issued Date -
Jan 2, 2014
app pub date -
Jan 18, 2012
filing date -
Mar 9, 2011
priority date (Note) -
Abandoned
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Abstract
A magnetic disk substrate production method by which the embedded alumina and the waviness of the substrate surface can be reduced is provided. The magnetic disk substrate production method includes the steps of (1) polishing a polishing surface of a substrate to be polished using a polishing liquid composition A containing alumina particles and water; (2) polishing the polishing surface of the substrate obtained in the step (1) using a polishing liquid composition B containing water and silica particles having an average primary particle size (D50) of 40 to 110 nm and a primary particle size standard deviation of 40 to 60 nm; (3) cleaning the substrate obtained in the step (2); and (4) polishing the polishing surface of the substrate obtained in the step (3) using a polishing liquid composition C containing silica particles and water.
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