SYSTEM AND METHOD FOR PURIFICATION OF SILANE USING LIQUID NITROGEN IN A POLYSILICON PRODUCTION PROCESS
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United States of America Patent
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Issued Date -
Jan 9, 2014
app pub date -
Nov 8, 2011
filing date -
Nov 17, 2010
priority date (Note) -
Abandoned
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Abstract
A system and method for improved cryogenic cooling of process streams in polysilicon manufacturing is provided. The disclosed system and method provides for the cryogenic cooling of a silane and hydrogen process stream during the manufacture of polysilicon with concurrent recovery of refrigeration capacity from the vaporized nitrogen as well as the recovery of refrigeration capacity from the cold hydrogen stream. The improved cryogenic cooling system and method reduces the overall consumption of liquid nitrogen without sacrificing cooling performance of the cryogenic cooling of the silane and hydrogen process stream.
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