MEMORY DEVICE AND METHOD OF MANUFACTURING MEMORY STRUCTURE

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United States of America Patent

APP PUB NO 20140036565A1
SERIAL NO

13565289

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Abstract

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An exemplary memory device includes a substrate and two word lines extending on the substrate. The substrate includes an active area. The two word lines are formed on the active area. Each word line includes a recessed portion corresponding to the active area. The recessed portion is defined by a planar top surface.

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Patent Owner(s)

Patent OwnerAddress
NANYA TECHNOLOGY CORPORATION243 NEW TAIPEI CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Jen Jui Taoyuan County, TW 4 13
LIN, Shian Jyh Yonghe City, TW 24 439

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