SUBSTRATE TREATING METHOD
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United States of America Patent
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Issued Date -
Mar 6, 2014
app pub date -
Aug 28, 2013
filing date -
Aug 31, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided is a substrate treating method. The substrate treating method may include treating a substrate by using a chemical solution; rinsing the substrate by using pure water after treating the substrate by using the chemical solution; and treating the substrate by using an organic solvent, wherein the substrate treating method further includes coating the substrate with a hydrophobic membrane between the treating of the chemical solution and the treating of the organic solvent.
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