APPARATUS AND METHODS FOR PHYSICAL VAPOR DEPOSITION
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United States of America Patent
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Issued Date -
Mar 13, 2014
app pub date -
Sep 10, 2012
filing date -
Sep 10, 2012
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
This disclosure provides systems, methods, and apparatus related to physical vapor deposition. In one aspect, an apparatus includes a magnet assembly including a magnet element, a substrate holder configured to hold a substrate, a target holder configured to hold a target positioned between the magnet assembly and the substrate, a motor configured to move the magnet assembly across a face of the substrate, and a controller. The controller includes program instructions for conducting a process including moving the magnet assembly across the face of the substrate using the motor to sputter material from the target onto the substrate. The material sputtered onto the substrate may have a substantially uniform thickness.
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