Semiconductor device and method of forming dual-sided interconnect structures in Fo-WLCSP
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United States of America Patent
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May 22, 2018
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N/A
app pub date -
Mar 15, 2013
filing date -
Sep 14, 2012
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Abstract
A semiconductor device has a substrate including first and second conductive layers formed over first and second opposing surfaces of the substrate. A plurality of wire studs or stud bumps is formed over the substrate. A semiconductor die is mounted to the substrate between the wire studs. A first encapsulant is deposited around the semiconductor die. A first interconnect structure is formed over the semiconductor die and first encapsulant. A second encapsulant is deposited over the substrate, semiconductor die, and first interconnect structure. The second encapsulant can be formed over a portion of the semiconductor die and side surface of the substrate. A portion of the second encapsulant is removed to expose the substrate and first interconnect structure. A second interconnect structure is formed over the second encapsulant and first interconnect structure and electrically coupled to the wire studs. A discrete semiconductor device can be formed on the interconnect structure.
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