APPARATUS FOR TREATING A GAS STREAM
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United States of America Patent
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Nov 21, 2013
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Aug 1, 2006
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Abstract
An apparatus for treating a gas stream comprises a nonthermal plasma reactor, for example a dielectric barrier discharge plasma reactor, containing a silicon-containing solid for reacting with a halogen-containing component of the gas stream to form a gaseous silicon halide. A sorbent bed of material chosen to react with the silicon halide to form inorganic halides is located downstream from the plasma reactor. A similar bed of material is located upstream from the plasma reactor to remove silicon halide and other acid gas components from the gas stream before it enters the plasma reactor.
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