Fe-Pt-C Based Sputtering Target
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United States of America Patent
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Issued Date -
Mar 27, 2014
app pub date -
Jul 20, 2012
filing date -
Sep 26, 2011
priority date (Note) -
Abandoned
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Abstract
Provided is a sintered sputtering target having a composition by atomic ratio represented by the formula: (Fe100-X—PtX)100-ACA (wherein A and X satisfy 20≦A≦50 and 35≦X≦55, respectively), wherein C particles are finely dispersed in a matrix alloy, and an oxygen content is 300 wt ppm or less. An object of the present invention is to provide an Fe—Pt based sputtering target having finely dispersed C particles and a low oxygen content, which allows manufacture of a granular structure magnetic thin film having excellent corrosion resistance, and further allows facilitation of ordering the L10 structure.
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