RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
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United States of America Patent
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Issued Date -
Apr 3, 2014
app pub date -
Oct 1, 2013
filing date -
Oct 2, 2012
priority date (Note) -
Abandoned
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Abstract
A resist composition including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) and a structural unit (a6) which generates acid upon exposure, and a method of forming a resist pattern using the resist composition. In general formula (a0-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Wa0 represents a single bond or an aliphatic hydrocarbon group having 1 to 5 carbon atoms and having a valency of (na0+1); Ra0 represents an aryl group of 4 to 16 carbon atoms which may have a substituent; and na0 represents 1 or 2.
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