Self-assembled pattern forming method
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United States of America Patent
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Mar 10, 2015
Grant Date -
Apr 10, 2014
app pub date -
Jun 28, 2013
filing date -
Oct 9, 2012
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Abstract
A self-assembled pattern forming method in an embodiment includes: forming a guide pattern on a substrate; forming a layer of a first polymer; filling a first block copolymer; and phase-separating the first block copolymer. The guide pattern includes a first recessed part having a depth T and a diameter D smaller than the depth T, and a second recessed part having a width larger than double of the diameter D. The first block copolymer has the first polymer and a second polymer which are substantially the same in volume fraction. By phase-separating the first block copolymer, a cylinder structure and a lamellar structure are obtained.
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