Devices, systems, and methods related to removing parasitic conduction in semiconductor devices

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United States of America Patent

PATENT NO 9082748
APP PUB NO 20140097441A1
SERIAL NO

13646307

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Abstract

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Semiconductor devices and methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming a stack of semiconductor materials from an epitaxial substrate, where the stack of semiconductor materials defines a heterojunction, and where the stack of semiconductor materials and the epitaxial substrate further define a bulk region that includes a portion of the semiconductor stack adjacent the epitaxial substrate. The method further includes attaching the stack of semiconductor materials to a carrier, where the carrier is configured to provide a signal path to the heterojunction. The method also includes exposing the bulk region by removing the epitaxial substrate.

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Patent Owner(s)

  • MICRON TECHNOLOGY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Basceri, Cem Los Gatos, US 324 8891
Gehrke, Thomas Boise, US 81 2797
Odnoblyudov, Vladimir Eagle, US 215 1294
Schubert, Martin F Boise, US 147 803

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