Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

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United States of America Patent

PATENT NO 9235116
APP PUB NO 20140099572A1
SERIAL NO

14104821

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Abstract

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According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.

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Patent Owner(s)

  • FUJIFILM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inasaki, Takeshi Shizuoka, JP 25 97
Kawabata, Takeshi Shizuoka, JP 104 1204
Tsuchimura, Tomotaka Shizuoka, JP 102 599

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