PROCESSING OF ELECTRONIC WASTE WITH SUPERCRITICAL NOBLE GASES
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United States of America Patent
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Issued Date -
May 8, 2014
app pub date -
Aug 12, 2013
filing date -
Nov 2, 2012
priority date (Note) -
Abandoned
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Abstract
A method of processing a material, the method including infiltrating a first disintegration fluid into a material at a first pressure, the first disintegration fluid including at least one supercritical noble gas, the first pressure being higher than a critical pressure of the first disintegration fluid, and disintegrating the material into particles by depressurizing the material from the first pressure to a second pressure, the second pressure being lower than the critical pressure of the first disintegration fluid.
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