PHOTOELECTRIC DEVICE AND THE MANUFACTURING METHOD THEREOF
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United States of America Patent
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May 15, 2014
app pub date -
Jul 23, 2013
filing date -
Nov 12, 2012
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Abstract
A photoelectric device includes: a semiconductor substrate including monocrystalline silicon and has first and second surfaces that are opposite to each other; a doping unit formed on the first surface of the semiconductor substrate; and an insulating layer that is formed between the doping unit and the second surface of the semiconductor substrate, wherein the doping unit includes: a first semiconductor layer including a first dopant doped in the monocrystalline silicon; and a second semiconductor layer including a second dopant doped in the monocrystalline silicon.
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