IN-LINE DEPOSITION SYSTEM WITH ENHANCED ADHESION OF MOLYBDENUM ON BOTTOM SHIELD
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United States of America Patent
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Issued Date -
May 22, 2014
app pub date -
Nov 18, 2013
filing date -
Nov 19, 2012
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An in-line sputtering system includes a chamber and a sputtering target near a top region of the chamber. The system also includes a moving device located on a bottom region of the chamber configured to move a plurality of planar substrates loaded horizontally in a row with at least a gap distance between any neighboring substrates, The gap distance allows the bottom region to be subjected to a deposition from the sputtering target as the gap distance moves across the entire bottom region along with the plurality of planar substrates by the moving device, The system further includes a bottom shield disposed to cover entire bottom region except the moving device and configured to adhere the deposition through the gap distance from the sputtering target for preventing a deposition buildup.
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