PROPYLENE-BASED PLYMER WITH LOW ASH AND DEVICE WITH SAME
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United States of America Patent
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app pub date -
Jul 26, 2012
filing date -
Jul 28, 2011
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Abandoned
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Abstract
The present disclosure provides a process for producing a wash-free propylene-based polymer with low total ash content for use as dielectric film. The propylene-based polymer contains a substituted phenylene aromatic diester and is suitable as a dielectric material for electrical devices.
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