LID OPENING/CLOSING SYSTEM FOR CLOSED CONTAINER, AND SUBSTRATE PROCESSING METHOD USING THE SAME

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United States of America Patent

SERIAL NO

14095173

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The partial pressure of an oxidizing gas within a FOUP fixed to a FIMS system and placed in an open state is prevented from increasing with the lapse of time. To that end, a gas supply port is arranged in the bottom face of the FOUP to enable nitrogen supply into the FOUP through the gas supply port with a pod mounted on the FIMS system. A nitrogen supply system for supplying nitrogen with the FOUP mounted is controlled so as to make a nitrogen supply at such a low flow rate and pressure as to be able to prevent dust or the like having such sizes as to possibly cause problems in wiring lines to be formed on a wafer from being stirred up from the gas supply port or the like.

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Patent Owner(s)

Patent OwnerAddress
TDK CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Emoto, Jun Tokyo, JP 20 192
IWAMOTO, Tadamasa Tokyo, JP 20 100
Miyajima, Toshihiko Tokyo, JP 55 799

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