METHOD AND DEVICE USING PHOTOELECTRONS FOR IN-SITU BEAM POWER AND STABILITY MONITORING IN EUV SYSTEMS

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United States of America Patent

SERIAL NO

14100109

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Abstract

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The invention presented is a real time EUV illumination metrology device that includes at least one pair of electrodes mounted on an insulator substrate with an aperture defined by the at least one pair of electrodes and/or the insulator substrate. The electrodes of each of the pairs of electrodes are separated by an arc suppression distance. In one alternate embodiment, the metrology device includes four pairs of electrodes. The device may also include a voltage biasing component to divert unwanted electrons that may distort illumination measurement. Also presented is an EUV illumination system incorporating the metrology device. One object of the invention is to provide a system of real time measurement of an EUV illumination beam.

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Patent Owner(s)

Patent OwnerAddress
KLA-TENCOR CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Umstadter, Karl Livermore, US 1 1
Wang, Li San Ramon, US 506 3762

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