MAGNETIC MASKS FOR AN ION IMPLANT APPARATUS
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United States of America Patent
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Issued Date -
Jun 19, 2014
app pub date -
Dec 11, 2013
filing date -
Dec 13, 2012
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An ion implant apparatus configured to measure the temperature or monitor the degradation of components in the apparatus is provided. The ion implant apparatus may include a platen configured to move in a first direction, a mask frame to hold one or more masks disposed on the platen, a first optical sensor configured to project an optical beam to a second optical sensor, and a measurement bar disposed on the mask frame, the measurement bar raised above the surface of the mask frame to interrupt the optical beam when the platen moves in the first direction.
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