CLEANING METHOD OF PROCESS CHAMBER
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United States of America Patent
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Feb 18, 2014
filing date -
Nov 17, 2009
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Abstract
A cleaning method of a process chamber to remove a nitride layer including aluminum and a transition metal, which is adhered to an inner surface of the process chamber, includes removing the nitride layer by supplying cleaning gases to the process chamber, wherein the cleaning gases comprises a first gas including boron and a second gas including fluorine.
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