Importance

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Abstract

Provided is a Fe—Al alloy sputtering target having an Al content of 1 to 23 at %, an oxygen content of 100 wt ppm or less, and the balance being Fe and inevitable impurities. Also, provided is a method of producing a Fe—Al alloy sputtering target having an Al content of 1 to 23 at %, an oxygen content of 100 wt ppm or less, and the balance being Fe and inevitable impurities, the method in which: a Fe raw material and an Al raw material, i.e., 1 to 23 at % of Al and the balance being Fe and inevitable impurities, are melted at a melting temperature of 1200 to 1600° C. and an average rate of raising temperature of 300° C./hr or more (wherein, when the Al content is 15 to 23 at %, the melting is performed at a melting temperature in the range of 1400 to 1600° C. and an average rate of raising temperature of 320° C./hr or more or at a melting temperature from 1200° C. to less than 1400° C.; and when the Al content is 1 to 15%, the melting is performed in an Ar atmosphere at a melting temperature in the range of 1200 to 1600° C. and an average rate of raising temperature of 300° C./hr or more or is performed in the air at a melting temperature in the range of 1200 to 1600° C. and an average rate of raising temperature of 320° C./hr or more); and the melted materials are cast, followed by rolling and machining. The present invention aims at providing a Fe—Al-based sputtering target having a reduced oxygen content, and providing a high-density sputtering target that can reduce occurrence of the phenomenon of abnormal discharge (micro arcing) and occurrence of particles during sputtering.

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First Claim