Resistive random access memory access cells having thermally isolating structures

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United States of America Patent

PATENT NO 8890109
SERIAL NO

13721658

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Abstract

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Provided are resistive random access memory (ReRAM) cells including resistive switching layers and thermally isolating structures for limiting heat dissipation from the switching layers during operation. Thermally isolating structures may be positioned within a stack or adjacent to the stack. For example, a stack may include one or two thermally isolating structures. A thermally isolating structure may directly interface with a switching layer or may be separated by, for example, an electrode. Thermally isolating structures may be formed from materials having a thermal conductivity of less than 1 W/m*K, such as porous silica and mesoporous titanium oxide. A thermally isolating structure positioned in series with a switching layer generally has a resistance less than the low resistance state of the switching layer. A thermally isolating structure positioned adjacent to a switching layer may have a resistance greater than the high resistance state of the switching layer.

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Patent Owner(s)

  • INTERMOLECULAR, INC.;SANDISK TECHNOLOGIES LLC;KABUSHIKI KAISHA TOSHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chiang, Tony P Campbell, US 208 9984
Minvielle, Tim San Jose, US 51 416
Wang, Yun San Jose, US 444 6545
Yamaguchi, Takeshi Kanagawa, JP 383 3215

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