Engineered substrates having epitaxial formation structures with enhanced shear strength and associated systems and methods
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United States of America Patent
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Sep 29, 2015
Grant Date -
Jul 3, 2014
app pub date -
Jan 2, 2013
filing date -
Jan 2, 2013
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Abstract
Engineered substrates having epitaxial formation structures with enhanced shear strength and associated systems and methods are disclosed herein. In several embodiments, for example, an engineered substrate can be manufactured by forming a shear strength enhancement material at a front surface of a donor substrate and implanting ions a depth into the donor substrate through the shear strength enhancement material. The ion implantation can form a doped portion in the donor substrate that defines an epitaxial formation structure. The method can further include transferring the epitaxial formation structure from the donor substrate to a front surface of a handle substrate. The shear strength enhancement material can be positioned between the epitaxial formation structure and the front surface of the handle substrate and bridge defects in the front surface of the handle substrate.
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