Dual-imprint pattern for apparatus
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United States of America Patent
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app pub date -
Jan 21, 2014
filing date -
Sep 30, 2010
priority date (Note) -
Abandoned
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Abstract
Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern.
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