Tuning a parameter associated with plasma impedance

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United States of America Patent

PATENT NO 9155182
APP PUB NO 20140197731A1
SERIAL NO

13740047

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a variable. The information is measured at a transmission line and is measured when the parameter has a first value. The transmission line is used to provide power to a plasma chamber. The method further includes determining whether the variable is at a local minima and providing the first value to tune the impedance matching circuit upon determining that the variable is at the local minima. The method includes changing the first value to a second value of the parameter upon determining that the variable is not at the local minima and determining whether the variable is at a local minima when the parameter has the second value.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lyndaker, Bradford J San Ramon, US 51 612
Valcore,, Jr John C Berkeley, US 89 1584

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