Pattern forming method and article manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9406510
APP PUB NO 20140199843A1
SERIAL NO

14147679

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Importance

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Abstract

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Provided is a method for forming a pattern on a layer on a substrate. The method includes forming a line-and-space pattern on the layer; coating a resist on the line-and-space pattern and filling the resist in a space portion of the line-and-space pattern; exposing a pattern to the resist, developing the exposed resist, and forming a resist pattern on the space portion; and forming a pattern on the layer using a pattern which is a combination of a line portion of the line-and-space pattern and the resist pattern as a mask.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gyoda, Yuichi Utsunomiya, JP 26 122
Tsujita, Kouichirou Utsunomiya, JP 34 186

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