VERTICAL DIFFUSION FURNACE
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United States of America Patent
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Issued Date -
Jul 24, 2014
app pub date -
Sep 3, 2013
filing date -
Jan 22, 2013
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A diffusion furnace includes a boat which supports a semiconductor wafer thereon and is rotatable together with the semiconductor wafer. A heater is arranged on the periphery of a core tube which houses the boat therein. The core tube includes a reaction gas supply pipe through which a reaction gas containing a dopant is supplied; and a cooling gas supply pipe through which a cooling gas is supplied toward an outer peripheral portion of the semiconductor wafer.
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