METHODS AND APPARATUS TO MONITOR AND CONTROL CLEANING SYSTEMS
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United States of America Patent
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Mar 19, 2014
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Sep 20, 2011
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Abstract
Methods and apparatus to monitor and control cleaning systems are disclosed. One disclosed example method includes detecting initial contamination of workpieces before cleaning and detecting residual contamination of workpieces after cleaning. The example method also includes determining, via a processor, a system malfunction from a comparison of the initial contamination with a first threshold value and from a comparison of the final contamination with a second threshold value. The system malfunction is determined from one or more of the determined initial contamination undershoots the first threshold value and the determined final contamination exceeds the second threshold value, the determined initial contamination exceeds the first threshold value and the determined final contamination exceeds the second threshold value, or the determined final contamination remains substantially constant for successive workpieces and exceeds the second threshold value with an absolute value that remains substantially constant.
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