Pattern forming method, method for manufacturing color filter, and color filter manufactured thereby

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United States of America Patent

PATENT NO 9352520
APP PUB NO 20140211334A1
SERIAL NO

14227342

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Abstract

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There is provided a pattern forming method, including: forming an organic film layer on a substrate; forming a patterned photoresist mask on the organic film layer; and performing a specific dry etching process to form a pattern on the organic layer.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sugishima, Yasuo Shizuoka, JP 28 142
Yoshibayashi, Mitsuji Shizuoka, JP 18 89

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